
Ph.D. in Materials Science and Engineering, Kyoto University, Japan (2003)
M.S. in Materials Science and Engineering, Kyoto University, Japan (2000)
B.S. in Engineering Science, Kyoto University, Japan (1998)
Research Associate, Institute of Industrial Science, University of Tokyo, Japan (2003-2007)
My research focuses on the fabrication of 3D photonic crystals using electrodeposition and multibeam interference lithography. Interference lithography creates 3D microperiodic porous structures with a variety of crystalline symmetry in photoresists. The resulting structures are expected to exhibit excellent optical properties due to their defect-free nature. However, to obtain additional functionality such as a photonic band gap, it is necessary to have higher refractive index contrast. Therefore the polymeric structure is used as a template to build an inverse structure with a higher index of refraction material. We have demonstrated that high-quality 3D photonic crystals can be fabricated through electrodeposition of Cu2O into a polymer template created by multibeam interference lithography followed by reactive ion etching of the template.

Figure 1. SEM images of 3D Cu2O photonic crystals. (a) Top surface and (b) fractured cross section.
Many materials can be electrodeposited, including semiconductors, oxides and conducting polymers. The combination of interference lithography and electrodeposition, therefore, has a great potential to produce a variety of photonic crystals with unique properties.